In this work pulsed laser-deposited thin films of MgO were studied for application in plasma display panels The firing voltage (FV) of discharge cells with MgO films was measured and the film structure was investigated as a function of film deposition conditions MgO thin films were deposited at oxygen pressure and substrate temperature between 0 02-5 Pa and 260-600 C, respectively The structure of thin films was investigated by using X-ray diffraction X-ray reflection and atomic force microscopy methods It was found that the FV is strongly correlated with the film deposition conditions and structural properties In general the FV values were smaller for the films with higher crystallinity and density The crystallinity and the density of the films Increased when the deposition temperature was raised and the O(2) pressure was reduced The lowest FV values (similar to 120 V) were obtained at the growth temperature of 550 C and at O(2) pressures below 1 Pa (C) 2010 Elsevier B V All rights reserved