화학공학소재연구정보센터
Thin Solid Films, Vol.519, No.14, 4542-4544, 2011
Activated gas jet deposition
The goal of this work is the elaboration of the new method of Hot Wire Chemical Vapor Deposition, when the activation of a precursor gas performs in a high speed jet, in which a hot-wire net is inserted. Oriented in a jet, transportation of a gas precursor adds new parameters to control a process of deposition. The first experiments were performed with the supersonic jet of C2F4, issued from the sonic nozzle after pyrolysis of the bulk Teflon in the high temperature reactor. The most interesting results are obtained by changing the net temperature. The film morphology is radically changed from separate fragments with micron characteristic sizes up to nanodisperse fractal-porous accretions. (C) 2011 Elsevier B.V. All rights reserved.