화학공학소재연구정보센터
Thin Solid Films, Vol.519, No.15, 4714-4716, 2011
One step sol-gel method for the formation of etch free texturing, anti-reflection coatings, and p-n junction for silicon solar cells
This study evaluated one step sol-gel process for the simultaneous formation of surface texturing without a series of chemical etching processes, as well as anti-reflection coatings without complicated vacuum processes and p-n junctions. The solutions for this process were prepared from a proper combination of precursors containing phosphorus and nano-size silicon dioxide particles. The specimen heat treated at 1000 degrees C showed the lowest reflectivity of 9% at a wavelength of 650 nm. In addition, the I-V test confirmed formation of a p-n junction. Therefore, the production of solar cells may be reduced to two steps, sol-gel and electrode printing. (C) 2011 Elsevier B.V. All rights reserved.