Thin Solid Films, Vol.519, No.15, 4952-4957, 2011
Formation of gold nanoparticles in silicon suboxide films prepared by plasma enhanced chemical vapour deposition
Nanostructured materials fabricated by dispersing metal particles on the dielectric surface have potential application in the field of nanotechnology. Interfacial metal particles/dielectric matrix interaction is important in manipulating the structural and optical properties of metal/dielectric films. In this work, a thin layer of gold (Au) was sputtered onto the surface of silicon oxide, SiO(x) (0.38
Keywords:Gold nanoparticles;Silicon suboxide (SiOx);Surface Plasmon Resonance (SPR);Plasma enhanced chemical vapour deposition (PECVD)