The structure of molybdenum layers deposited by direct current magnetron sputtering onto the amorphous silicon (a-Si) layers as function of nominal layer thickness was studied by methods of transmission electron microscopy. Molybdenum layers with nominal thickness 1.50] direction. As the metal layer thickness increases Mo-crystallites take the more regular form at the expense of recrystallization. (C) 2011 Elsevier B.V. All rights reserved.