Thin Solid Films, Vol.520, No.3, 1084-1090, 2011
Design and fabrication of InxGa(1-x)N/GaN solar cells with a multiple-quantum-well structure on SiCN/Si(111) substrates
The fabrication and characterization of InxGa(1-x)N/GaN-based solar cells that use InxGa(1-x)N multiple quantum wells (MQWs) and a SiCN/Si(111) substrate are reported. Solar cell operation with a low dark current density (J(d)), a high open-circuit voltage (V-oc), a high short-circuit current density (J(sc)), and a high fill factor (FF) is demonstrated. It was found that the proposed device and fabrication technology are applicable to the realization of solar cells with a low J(d) of 2.14 to 8.88 mu A/cm(2), a high V-oc of 2.72 to 2.92 V, a high J(sc) of 2.72 to 2.97 mA/cm(2), and a high FF of 61.51 to 74.89%. The device performance with various quantum-well configurations was investigated under an air mass 1.5 global solar spectrum. A high photovoltaic efficiency of 5.95% in the MQW sample over the p-i-n sample was observed. (C) 2011 Elsevier B.V. All rights reserved.
Keywords:InxGa(1-x)N/GaN-based solar cells;Multiple quantum wells (MQWs);SiCN/Si(111) substrate;Dark current density (J(d));Open-circuit voltage (V-oc);Short-circuit current density (J(sc));Fill factor (FF)