화학공학소재연구정보센터
Thin Solid Films, Vol.520, No.7, 2663-2666, 2012
Epitaxial growth of ZnO layers on (111) GaAs substrates by laser molecular beam epitaxy
ZnO layers were grown on (111) GaAs substrates by laser molecular epitaxy at substrate temperatures between 200 and 550 degrees C. X-ray diffraction analysis revealed that c-axis of ZnO epilayer with a wurtzite structure is perpendicular to the substrate surface. X-ray rocking curves and Raman spectroscopy showed that the crystal quality of ZnO epilayers depends on the substrate temperature during the growth. Strong near-band-edge emission in the UV region without any deep-level emissions was observed from the ZnO epilayers at room temperature. The results indicate that laser molecular beam epitaxy is a promising growth method for obtaining high-quality ZnO layers on (111) GaAs substrates. (C) 2011 Elsevier B.V. All rights reserved.