화학공학소재연구정보센터
Korean Journal of Chemical Engineering, Vol.30, No.3, 714-723, March, 2013
Adsorption of phenol and 1-naphthol onto XC-72 carbon
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XC-72 carbon (XC-72) was characterized by SEM, XPS, N2 adsorption-desorption, particle size distribution analysis and potentiometric acid-base titration. The adsorption of phenol and 1-naphthol on XC-72 was studied as a function of contact time, pH, adsorbent content and temperature. The kinetic adsorption data were described well by the pseudo-second-order model. The adsorption isotherms of phenol were described well by Freundlich model, while the adsorption isotherms of 1-naphthol were fitted well by Langmuir model. The results demonstrated that XC-72 had much higher adsorption capacity for 1-naphthol than for phenol. The adsorption thermodynamic data were calculated from the temperature-dependent adsorption isotherms at T=293, 313 and 333 K, and the results indicated that the adsorption of phenol was an exothermic process, whereas the adsorption of 1-naphthol was an endothermic process. XC-72 is a suitable material for the preconcentration of phenol and 1-naphthol from large volumes of aqueous solutions.
  1. Yin JJ, Chen R, Ji YS, Zhao CD, Zhao GH, Zhang HX, Chem. Eng. J., 157(2-3), 466 (2010)
  2. Rodriguez I, Llompart MP, Cela R, J. Chromatogr. A., 885, 291 (2000)
  3. Al-Asheh S, Banat F, Abu-Aitah L, Sep. Purif. Technol., 33(1), 1 (2003)
  4. Li Z, Wu MH, Jiao Z, Bao BR, Lu SL, J. Hazard. Mater., 114(1-3), 111 (2004)
  5. Shao DD, Sheng GD, Chen CL, Wang XK, Nagatsu M, Chemosphere., 79, 679 (2010)
  6. Anirudhan TS, Sreekumari SS, Bringle CD, Adsorption., 15, 439 (2009)
  7. Hu J, Shao DD, Chen CL, Sheng GD, Li JX, Wang XK, Nagatsu M, J. Phys. Chem. B, 114(20), 6779 (2010)
  8. Kennedy LJ, Vijaya JJ, Kayalvizhi K, Sekaran G, Chem. Eng. J., 132(1-3), 279 (2007)
  9. Ahmaruzzaman M, Sharma DK, J. Colloid Interface Sci., 287(1), 14 (2005)
  10. Chen CL, Li XK, Zhao DL, Tan XL, Wang XK, Colloids Surf. A., 302, 449 (2007)
  11. Anirudhan TS, Sreekumari SS, Bringle CD, Adsorption., 15, 439 (2009)
  12. Lohwacharin J, Oguma K, Takizawa S, Water. Res., 43, 3076 (2009)
  13. Ghosh U, Hum. Ecol. Risk. Assess., 13, 276 (2007)
  14. Yu JJ, Du W, Zhao FQ, Zeng BZ, Electrochim. Acta, 54(3), 984 (2009)
  15. Shao DD, Jiang ZQ, Wang XK, Plasma Process. Polym., 7, 552 (2010)
  16. Chen CL, Hu J, Xu D, Tan XL, Meng YD, Wang XK, J. Colloid Interface Sci., 323(1), 33 (2008)
  17. Hu J, Chen CL, Zhu XX, Wang XK, J. Hazard. Mater., 162(2-3), 1542 (2009)
  18. Bond AM, Miao WJ, Raston CL, Langmuir, 16(14), 6004 (2000)
  19. Shao DD, Jiang ZQ, Wang XK, Li JX, Meng YD, J. Phys. Chem. B, 113(4), 860 (2009)
  20. Chen CL, Liang B, Ogino A, Wang XK, Nagatsu M, J.Phys. Chem. C., 113, 7659 (2009)
  21. Shao DD, Fan QH, Li JX, Niu ZW, Wu WS, Chen YX, Wang XK, Micro. Macro. Material., 123, 1 (2009)
  22. Shao DD, Xu D, Wang S, Fan QH, Wu W, Dong Y, Wang XK, Sci. China B., 52, 362 (2009)
  23. Tan XL, Chang PP, Fan QH, Zhou X, Yu SM, Wu WS, Wang XK, Colloids Surf. A., 328, 8 (2008)
  24. Tan XL, Fan QH, Wang XK, Grambow B, Environ. Sci.Technol., 43, 3115 (2009)
  25. Xu D, Tan XL, Chen CL, Wang XK, J. Hazard. Mater., 154(1-3), 407 (2008)
  26. Guo XY, Zhang SZ, Shan XQ, J. Hazard. Mater., 151(1), 134 (2008)
  27. Huang Y, Ma XY, Liang GZ, Yan HX, Chem. Eng. J., 141(1-3), 1 (2008)
  28. Chen W, Duan L, Wang LL, Zhu DQ, Environ. Sci. Technol., 42, 6862 (2008)
  29. Yang K, Wu W, Jing Q, Zhu L, Environ. Sci. Technol., 42, 7931 (2008)
  30. Sheng GD, Shao DD, Ren XM, Wang XQ, Li JX, Chen YX, Wang XK, J. Hazard. Mater., 178(1-3), 505 (2010)
  31. Yan LG, Shan MQ, Wen B, Zhang SZ, J. Colloid Interface Sci., 308(1), 11 (2007)
  32. Srivastava VC, Swamy MM, Mall ID, Prasad B, Mishra IM, Colloids Surf. A., 272, 89 (2006)
  33. Chen W, Duan L, Zhu D, Environ. Sci. Technol., 41, 8295 (2007)
  34. Chen CL, Ogino A, Wang XK, Nagatsu M, Appl. Phys. Lett., 96, 131504 (2010)
  35. Chen CL, Wang XK, Nagatsu M, Environ. Sci. Technol., 43, 2362 (2009)
  36. Fan QH, Tan XL, Li JX, Wang XK, Wu WS, Montavon G, Environ. Sci. Technol., 43, 5776 (2009)
  37. Fan QH, Shao DD, Hu J, Chen CL, Wu WS, Wang XK, Radiochim. Acta., 97, 141 (2009)
  38. Tan XL, Wang XK, Fang M, Chen CL, Colloids Surf. A., 296, 109 (2007)
  39. Pan B, Xing BS, Environ. Sci. Technol., 42, 9005 (2008)
  40. Zhao GX, Zhang HX, Fan QH, Ren XM, Li JX, Chen YX, Wang XK, J. Hazard. Mater., 173(1-3), 661 (2010)
  41. Mukherjee S, Kumar S, Misra AK, Fan MH, Chem. Eng. J., 129(1-3), 133 (2007)
  42. Tan XL, Fang M, Chen CL, Yu SM, Wang XK, Carbon., 46, 1741 (2008)
  43. Chowdhury ZZ, Zain SM, Khan RA, Islam MS, Korean J. Chem. Eng., 29, 1 (2012)
  44. Tan XL, Fang M, Wang XK, J. Nanosci. Nanotechnol., 8, 5624 (2008)
  45. Sheng GD, Li JX, Shao DD, Hu J, Chen CL, Chen YX, Wang XK, J. Hazard. Mater., 178(1-3), 333 (2010)
  46. Cai P, Zheng H, Wang C, Ma HW, Hu JC, Pu YB, Liang P, J. Hazard. Mater., 213, 100 (2012)
  47. Stafiej A, Pyrzynska K, Sep. Purif. Technol., 58(1), 49 (2007)
  48. Bahdod A, Asri SE, Saoiabi A, Coradin T, Laghzizil A, Water.Res., 43, 313 (2009)
  49. Yousef RI, El-eswed B, Colloids Surf. A., 334, 92 (2009)
  50. Ahmaruzzaman M, Sharma DK, J. Colloid Interface Sci., 287(1), 14 (2005)
  51. Anbia M, Moradi SE, Korean J. Chem. Eng., 29(6), 743 (2012)