화학공학소재연구정보센터
Journal of Industrial and Engineering Chemistry, Vol.19, No.2, 566-570, March, 2013
Enhanced solvent resistance of acrylonitrile-butadiene rubber by electron beam irradiation
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In this study, we investigated the effect of electron beam irradiation on NBR (acrylonitrile-butadiene rubber) with TMPTMA (trimethylolpropane trimethacrylate), focusing on the polar and non-polar solvent resistance at different electron beam radiation doses. The electron beam irradiation on NBR containing TMPTMA sheets was performed over a range of absorbed doses from 20 to 200 kGy to make three-dimensional network structures. The solvent resistance was characterized according to ASTM D 471 in benzene and THF solvent. The solvent resistance of NBR was enhanced by the addition of TMPTMA in a dose-dependent manner. In addition, the volume change of immersed NBR in THF solvent was slightly lower than in benzene solvent.
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