나프토퀴논 디아지드 유도체의 합성 및 그 감광 특성

주소영; 홍성일

Journal of the Korean Industrial and Engineering Chemistry, Vol.1, No.2, 116-123, December, 1990

Export Citation

나프토퀴논 디아지드 유도체의 합성 및 그 감광 특성

Synthesis and Characterization of Photosensitive Naphthoquinonediazide-sulfonyl Derivatives

주소영, 홍성일

초록

감광성 orthonaphthoquinonediazide-sulfonyl 유도체를 합성하고, 그 감광특성에 대해 검토한 결과, UV에 의해 광변환 되어, 알칼리 가용성의 분해화합물이 생성됨을 확인하였다. 이 유도체를 PAC로, m-cresol novolac을 matrix resin으로 photoresist를 제조하고 감광 특성을 고찰하여, 미세 패턴용 photoresist로의 타당성을 확인하였다. 3, 4, 5-Trihydroxybenzophenone 의 벌키한 공명 구조는 노광부의 감도와 가용성을 향상시켰으며, PAC 와 matrix resin의 혼합 무게비가 3:8 일 때 가장 적절한 dissolution rate를 나타냈으므로, 이 photoresist가 정해진 조건 하에서 감도, 해상력이 가장 우수하였다.

Synthesis and characterization of photosensitive orthonaphthoquinonediazide-sulfonyl derivatives were studied. These photoactive compounds underwent a UV induced transformation to the base-soluble photoproduct. The photoresists were prepared using these photoactive compounds with low molecular weight m-cresol novolacs as matrix resin. And photosensitive characteristics of the photoresists were studied. 3, 4, 5-Trihydroxy-benzophenone with bulky resonance structure increased the sensitivity and the solubility rate of the exposed region. The mixture of PAC and matrix resin having 3:8 weight ratio had the moderate rate of dissolution in the developer. The photoresist using these conditions showed the best snsitivity and contrast under the fixed conditions.

[References]

Thompson LF, "Materials for Microlithography," American Chemical Society, Washington, D.C. (1984)
Thompson LF, Wilson CG, Bowden MJ, "Introduction to Microlithography," American Chemical Society, Washington, D.C. (1983)
Bowden MJ, Turner SR, "Electronic and Photonic Applications of Polymers," American Chemical Society, Washington, D.C. (1988)
Vollenbroek FA, Spiertz EJ, "Advances in Polymer Science: 84 Electronic Application," Springer-Verlag Berlin Heidelberg, New York (1977)
Bolsen M, Microelectronic Eng., 3, 321 (1985)
Pacansky J, Lyerla JR, IBM J. Res. Develop., 23, 42 (1979)
Bowden MJ, Thompson LF, Fahrenholtz SR, Doerries EM, J. Electrochem. Soc.: Solid-State Sci. Technol., 128(6), 1304 (1981)
Dill FH, Hornberger WP, Hauge PS, Shaw JM, IEEE Trans. Electron Devices, ED22(7), 445 (1975)
Washo BD, IBM J. Res. Develop., 190 (1977)
Dill FH, Shaw JM, IBM J. Res. Develop., 210 (1977)
Deckert CA, Ross DL, J. Electrochem. Soc., 127(3), 45C (1980)
Michl J, Downing J, Polym. Eng. Sci., 23(18), 1004 (1983)
Illten DF, J. Electrochem. Soc.: Solid-State Sci. Technol., 119(4), 537 (1972)
Broers AN, IEEE Trans. Electron Devices, ED28(11), 1268 (1981)

[Referenced By]

[1] Thompson LF, "Materials for Microlithography," American Chemical Society, Washington, D.C. (1984)

[2] Thompson LF, Wilson CG, Bowden MJ, "Introduction to Microlithography," American Chemical Society, Washington, D.C. (1983)

[3] Bowden MJ, Turner SR, "Electronic and Photonic Applications of Polymers," American Chemical Society, Washington, D.C. (1988)

[4] Vollenbroek FA, Spiertz EJ, "Advances in Polymer Science: 84 Electronic Application," Springer-Verlag Berlin Heidelberg, New York (1977)

[5] Bolsen M, Microelectronic Eng., 3, 321 (1985)

[6] Pacansky J, Lyerla JR, IBM J. Res. Develop., 23, 42 (1979)

[7] Bowden MJ, Thompson LF, Fahrenholtz SR, Doerries EM, J. Electrochem. Soc.: Solid-State Sci. Technol., 128(6), 1304 (1981)

[8] Dill FH, Hornberger WP, Hauge PS, Shaw JM, IEEE Trans. Electron Devices, ED22(7), 445 (1975)

[9] Washo BD, IBM J. Res. Develop., 190 (1977)

[10] Dill FH, Shaw JM, IBM J. Res. Develop., 210 (1977)

[11] Deckert CA, Ross DL, J. Electrochem. Soc., 127(3), 45C (1980)

[12] Michl J, Downing J, Polym. Eng. Sci., 23(18), 1004 (1983)

[13] Illten DF, J. Electrochem. Soc.: Solid-State Sci. Technol., 119(4), 537 (1972)

[14] Broers AN, IEEE Trans. Electron Devices, ED28(11), 1268 (1981)