Rheological behavior and film characterization of fumed silica dispersion in carbodiimide based UV-curable coating material

Sung Hyun Moon; Jong Sung You; Jeong-Su Kim; Jeong Ohk Kweon; Jae Beom Ahn; Si Tae Noh

Macromolecular Research, Vol.21, No.2, 146-152, February, 2013

DOI10.1007/s13233-013-1012-y Export Citation

Rheological behavior and film characterization of fumed silica dispersion in carbodiimide based UV-curable coating material

Sung Hyun Moon, Jong Sung You, Jeong-Su Kim, Jeong Ohk Kweon, Jae Beom Ahn¹, and Si Tae Noh^†

Department of Chemical Engineering, College of Engineering Sciences, Hanyang University, Gyeonggi, 426-791, Korea
¹Noroo BEE Chemical Co., Ltd., Chungnam, 330-220, Korea

E-mail:

Carbodiimide based UV curable coating materials, which were developed as a high refractive raw coating material, were prepared by dispersion with fumed silica inorganic particles in order to overcome low hardness and strength of the cured films. Three kinds of fumed silica particles were dispersed having various reactive surfaces, and the rheological behavior of the dispersions was observed. Compared to the hydrophilic silica (Si-hi) dispersion, two types of hydrophobic silica (Si-ho-n and Si-ho-a) dispersion showed sol behavior in high concentrations. In particular, the Si-ho-a dispersion showed viscous sol characteristics for high shear rates. The surface hardness of the film obtained by UV curing of the fumed silica dispersion increased in the more highly concentrated dispersion, and the haze of the film also increased. Further, the film was highly refractive.

Keywords:UV coating;silica;dispersion;rheology;carbodiimide

[References]

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Glockner P, Radiation Curing Coatings and Printing Inks, Vincentz Network GmbH & Co KG, Hannover (2008)
Masson F, Decker C, Andre S, Andrieu X, Prog. Org.Coat., 49, 1 (2004)
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Lee SH, Kim HG, Kim SS, Macromol. Res., 18(1), 40 (2010)
Cho JD, Kim YB, Ju HT, Hong JW, Macromol. Res., 13(4), 362 (2005)
Barther H, U.S. Patent 0,207,842 (2008)
Ha H, Kim SC, Ha KR, Macromol. Res., 18(7), 674 (2010)
Yu H, Yuan O, Wang D, J. Appl. Polym. Sci., 94, 1647 (2004)
Hong LY, Cho YS, Kim DP, J. Ind. Eng. Chem., 11(2), 275 (2005)
Anderson BJ, Zukoski CF, Macromolecules, 41(23), 9326 (2008)
Dekruif CG, Vanlersel EMF, Vrij A, Russel WB, J.Chem. Phys., 83, 4717 (1985)
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Colic M, Fisher ML, Franks GV, Langmuir, 14(21), 6107 (1998)
Chapel JP, Langmuir, 10(11), 4237 (1994)
Vigil G, Xu ZH, Steinberg S, Israelachvili J, J. Colloid Interface Sci., 165(2), 367 (1994)
Atkins DT, Ninham BW, Colloids Surf., 129, 23 (1997)
Macosko CW, Rheolog: Principles. Measurements and Application, VCH Publisher, New York (1994)
Cheng ZD, Zhu JX, Chaikin PM, Phan SE, Russel WB, Phys. Rev., 65, 41405 (2002)
Park JT, Seo JA, Ahn SH, Kim JH, Kang SW, J. Ind. Eng. Chem., 16(4), 517 (2010)
Hato MJ, Zhang K, Ray SS, Choi HJ, Colloid Polym.Sci., 289, 1119 (2011)
Park SS, Lee SB, Kim NJ, J. Ind. Eng. Chem., 16(4), 551 (2010)
Mourchid A, Lecolier E, Van Damme H, Levitz P, Langmuir, 14(17), 4718 (1998)
Mourchid A, Delville A, Lambard J, Lecolier E, Levitz P, Langmuir, 11(6), 1942 (1995)
Fang FF, Lee BM, Choi HJ, Macromol. Res., 18(2), 99 (2010)
Kim YC, Kim JC, J. Ind. Eng. Chem., 13(6), 1029 (2007)
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[Related Articles]

[1] Schwalm R, UV Coatings Basic, Recent Developments and New Applications, Elsevier Science (2007)

[2] Glockner P, Radiation Curing Coatings and Printing Inks, Vincentz Network GmbH & Co KG, Hannover (2008)

[3] Masson F, Decker C, Andre S, Andrieu X, Prog. Org.Coat., 49, 1 (2004)

[4] Nebioglu A, Leon JA, Igor VK, J. Ind. Eng. Chem., 47, 2155 (2008)

[5] Taylor JW, Collins MJ, Bassett DR, U.S. Patent 5,439,982 (1995)

[6] Harada SK, Sasaoka Y, Tanaka T, WO Patent WO 061,081 (2007)

[7] Porziso RS, Haberle K, Wildeson J, Jung M, Willenbacher N, Borger L, U.S. Patent 0,220,462 (2003)

[8] Lee SH, Kim HG, Kim SS, Macromol. Res., 18(1), 40 (2010)

[9] Cho JD, Kim YB, Ju HT, Hong JW, Macromol. Res., 13(4), 362 (2005)

[10] Barther H, U.S. Patent 0,207,842 (2008)

[11] Ha H, Kim SC, Ha KR, Macromol. Res., 18(7), 674 (2010)

[12] Yu H, Yuan O, Wang D, J. Appl. Polym. Sci., 94, 1647 (2004)

[13] Hong LY, Cho YS, Kim DP, J. Ind. Eng. Chem., 11(2), 275 (2005)

[14] Anderson BJ, Zukoski CF, Macromolecules, 41(23), 9326 (2008)

[15] Dekruif CG, Vanlersel EMF, Vrij A, Russel WB, J.Chem. Phys., 83, 4717 (1985)

[16] Iler RK, The Chemistry of Silica: Solubility, Polymerization, Colloid and Surface Properties and Biochemistry, John Wiley & Sons, New York (2001)

[17] Colic M, Fisher ML, Franks GV, Langmuir, 14(21), 6107 (1998)

[18] Chapel JP, Langmuir, 10(11), 4237 (1994)

[19] Vigil G, Xu ZH, Steinberg S, Israelachvili J, J. Colloid Interface Sci., 165(2), 367 (1994)

[20] Atkins DT, Ninham BW, Colloids Surf., 129, 23 (1997)

[21] Macosko CW, Rheolog: Principles. Measurements and Application, VCH Publisher, New York (1994)

[22] Cheng ZD, Zhu JX, Chaikin PM, Phan SE, Russel WB, Phys. Rev., 65, 41405 (2002)

[23] Park JT, Seo JA, Ahn SH, Kim JH, Kang SW, J. Ind. Eng. Chem., 16(4), 517 (2010)

[24] Hato MJ, Zhang K, Ray SS, Choi HJ, Colloid Polym.Sci., 289, 1119 (2011)

[25] Park SS, Lee SB, Kim NJ, J. Ind. Eng. Chem., 16(4), 551 (2010)

[26] Mourchid A, Lecolier E, Van Damme H, Levitz P, Langmuir, 14(17), 4718 (1998)

[27] Mourchid A, Delville A, Lambard J, Lecolier E, Levitz P, Langmuir, 11(6), 1942 (1995)

[28] Fang FF, Lee BM, Choi HJ, Macromol. Res., 18(2), 99 (2010)

[29] Kim YC, Kim JC, J. Ind. Eng. Chem., 13(6), 1029 (2007)

[30] Brunauer S, Emmett PH, Teller E, J. Am. Chem. Soc., 60, 309 (1938)