Silicon-doped TiO2 (Si-TiO2) and pure TiO2 films were deposited on titanium substrates by cathodic arc deposition technique. The surface characteristics of the films, such as surface topography, elemental composition and wettability, were studied. About 4.6 % Si was incorporated into the Si-TiO2 films with a water contact angle of about 83A degrees. The adhesive behaviors of osteoblast-like MG63 cells on both films were investigated through cell counting assay, immunocytochemistry, real-time PCR and western blotting analysis. Cells cultured on the Si-TiO2 films had a greater cellular viability, stronger cytoskeleton and focal adhesion, and more cellular spreading than those on the pure TiO2 films. Moreover, the expression levels of integrin beta 1 and focal adhesion kinase (FAK) genes, FAK and the phosphorylation of FAK proteins were up-regulated in cells cultured on the Si-TiO2 films. These results indicated that the Si-TiO2 films possess significantly enhanced cytocompatibility and provide potential solutions for the surface modification of implants in the future.