We report the characterization of individual carbon nanotube and Si nanowire field-effect transistors through high-speed scanning photocurrent microscopy with a scanning speed of 1 frame/s and a photocurrent sensitivity of less than 1 pA. This enables us to record photocurrent images that are free from hysteresis effects that modify the field configurations applied by the gate bias voltage. We can clearly resolve the photocurrent signals with polarity inversion near the metallic contacts under gate bias conditions which cause severe hysteresis effects in the nanowire devices. We also studied the dynamics of the hysteresis effects for different gate bias configurations. This high-speed photocurrent imaging technique is particularly useful for obtaining two-dimensional, localized optoelectronic characteristics and their correlation with overall device performance without encountering undesired dynamic responses. (C) 2013 Elsevier B.V. All rights reserved.