Previous Article Next Article Table of Contents Advanced Materials, Vol.25, No.43, 6261-6265, 2013 DOI10.1002/adma.201301555 Export Citation Novel Hybrid Organic-Inorganic Spin-on Resist for Electron- or Photon-Based Nanolithography with Outstanding Resistance to Dry Etching Zanchetta E, Della Giustina G, Grenci G, Pozzato A, Tormen M, Brusatin G [Referenced By] Please enable JavaScript to view the comments powered by Disqus.
