Novel Hybrid Organic-Inorganic Spin-on Resist for Electron- or Photon-Based Nanolithography with Outstanding Resistance to Dry Etching (vol 25, pg 6261, 2013)

Zanchetta E; Della Giustina G; Grenci G; Pozzato A; Tormen M; Brusatin G

Advanced Materials, Vol.26, No.5, 674-674, 2014

DOI10.1002/adma.201303707 Export Citation

Novel Hybrid Organic-Inorganic Spin-on Resist for Electron- or Photon-Based Nanolithography with Outstanding Resistance to Dry Etching (vol 25, pg 6261, 2013)

Zanchetta E, Della Giustina G, Grenci G, Pozzato A, Tormen M, Brusatin G