Previous Article Next Article Table of Contents Advanced Materials, Vol.26, No.8, 1207-1216, 2014 DOI10.1002/adma.201304096 Export Citation Fabrication of Ordered, Large Scale, Horizontally-Aligned Si Nanowire Arrays Based on an In Situ Hard Mask Block Copolymer Approach Ghoshal T, Senthamaraikannan R, Shaw MT, Holmes JD, Morris MA Keywords:block copolymers;nanowires;patterning;silicon;photoelectron spectroscopy Please enable JavaScript to view the comments powered by Disqus.
