Interfacial phenomena involved in the underpotential deposition of tellurium layers were studied with an electrochemical quartz crystal nanobalance (EQCN) in perchloric acid solution (pH = 1). The in situ study of the oxidation kinetics showed that the oxidation of the Te layer deposited neighbor a Te(ads)/Au provides evidence of TeO(2ads) formation with the incorporation of oxygen to induce the formation of H(2)TeO(3). From the calculations of the first tellurium layer (82 ng cm(-2)), the mass expected for the second layer deposited in underpotential control was found. Moreover, the oxidation of Te(ads) followed a bi-functional mechanism involving the oxygen incorporated before the tellurium oxidation at high overpotentials. The combination of powerful interfacial methods (cyclic voltammetry and EQCN) gives a new perspective on tellurium electrodeposition and leads to a comprehensive understanding of the interfacial architecture. (C) 2011 Elsevier Ltd. All rights reserved.