A simple technique for patterning organic materials using a surfactant assisted lift-off method is proposed. Thin films of various organic materials are prepared, and areas in contact with a surfactant coated poly(dimethylsiloxane) (PDMS) stamp are selectively removed. The general applicability of this technique is shown for materials containing nitrate, amine, and carboxylic acid functional groups. This technique provides a new methodology for fabricating patterns with vertical dimensions ranging from 30 nm up to 3 mu m on organic thin films with specific functional groups. (C) 2012 Elsevier Inc. All rights reserved.