Tetramethylsilane (TMS) is commonly used as a precursor in the production of SiC(beta) films at relatively low temperatures. However, because TMS contains much more C than Si, it is difficult to produce solid phase SiC at high temperatures. In an attempt to develop a more efficient TMS-based SiC(alpha) process, computational thermodynamic simulations were performed under various temperatures, working pressures and TMS/H-2 ratios. The findings indicate that each solid phase has a different dependency on the H-2 concentration. Consequently, a high H-2 concentration results in the formation of a single, solid phase SiC region at high temperatures. Finally, TMS appears to be useful as a precursor for the high temperature production of SiC(alpha). (C) 2012 Elsevier B.V. All rights reserved.