For electronic devices thin magnetic single and multi - layers, with a thickness below 2 mum are increasingly used. The magnetic properties of the thin magnetic layers depend on their chemical composition, layer thickness, homogeneity and roughness as well as on the texture and the residual stress state. Layer thickness, homogeneity, roughness, texture and residual stress state essentially are determined by the process parameters of the manufacturing process. Here the dependence of the layer characteristics and their texture and residual stress state on the process parameters sputter power and argon partial pressure is investigated using transmission electron microscopy and diffraction methods and relations between texture and residual stress values of the layers and coercivity are shown.