Thermally activated Chemical Vapor Deposition with imposition of a steady magnetic field (MCVD) was conducted to deposit iron films. The deposition was performed at the substrate temperature below Curie point of iron, and in a range of the magnetic field less than 4T(tesla). In the deposition process, island crystals in several micron scales were formed. The films were formed by their coalescence. Texture and grain structures of these deposits were investigated. It was observed that imposition of magnetic field affected the degree of (100) texture in the island state crystals. As an increase of the magnetic field intensity, population of cube-shaped islands increased, and the (200) rocking curve became sharp. However, a textured iron film was not obtained by imposition of the magnetic field. The tendency of no (100) preferred orientation in the film state was inferred to be related to the following phenomena: The secondary grown crystals on the island-shaped crystals did not necessarily possess (100) orientation. And the film had zone III grain structure due to occurrence of the grain boundary migration.