Materials Science Forum, Vol.426-4, 3531-3536, 2003
Study of the surface oxidation epitaxy of pure Ni
The growth of nickel oxide (NiO) on {100}<001> cube textured, rolling assisted biaxially textured substrates (RABiTS) of pure nickel was studied with respect to the oxidation time (t(ox)) and temperature (T-ox), in oxygen and air. Single phase (100) NiO formed only in a narrow temperature range centred on 1240-1260degreesC (similar to1250+/-10degreesC). At lower or higher temperatures, other orientations, namely (111), (311) and (220) also formed. At the optimum temperature of 1250+/-10degreesC, formation of practically single phase (100) NiO was observed for short oxidation, t(ox) less than or equal to 10 min and for long oxidation, t(ox) > 120 min.