Materials Science Forum, Vol.433-4, 459-462, 2002
Electrical characterization of erbium-implanted 4H-SiC epilayers
Er-implanted n- and p-type 4H-SiC epilayers are investigated by deep level transient spectroscopy. Two Er-related peaks are identified at E-V+0.67eV and E-V+0.68eV. These defects are donor-like with temperature-independent capture-cross-section.
Keywords:deep level transient spectroscopy;erbium