The technology of selective plasma etching was applied to improve the affinity to metallization of a graphite/polymer composite. Plasma etching was performed by exposure of samples to oxygen plasma with the electron temperature of 70000degreesC, the density of positive ions of 7x10(15) m(-3) and the density of neutral oxygen atoms of 2x10(21) m(-3). The concentration of polymer on the surface was determined from the AES S to C peak ratio. The wettability of the samples was determined from the distilled water drop contact angle and the adhesion of a galvanic deposited thin nickel film by a pull test. It was found that plasma treatment improves the adhesion four times. The improvement of adhesion was explained by the improved wettability due to the removal of the surface layer of polymer.