In this work, a series of water-soluble organic acids has been screened in place of inorganic acids (c.g.HNO(3), H(2)SO(4) and HCl). Oxalic acid was identified to be an effective substitute for the inorganic acids as the main component in the chemical polishing solutions for ferrous alloys. An optimum formula in terms of gloss, polishing rate and post polishing protection has been established. Possible chemical functions of oxalic acid in the chemical polishing process have also been elaborated.