화학공학소재연구정보센터
Materials Science Forum, Vol.475-479, 3887-3890, 2005
The use of trimethylaluminum for producing surface layers by the PACVD method
The paper presents the use of trimethylaluminum in PACVD method to obtain the surface layers like alumina or aluminum nitride on Inconel nickel alloy. The glow discharge nitriding at a temperature of 750 degrees C leads to the formation of aluminum oxynitride in the layer, whereas annealing in argon plasma at a temperature of 1050 degrees C - to the formation of nickel and aluminum based intermetallic phases of the NiAl or Ni3Al type with aluminum oxide present within the outer zone of the coating. The presence of the surface layer of the Al2O3+NiAl+Ni(3)AI type formed on nickel alloys may be significant from the point of view of the applications that require a high heat resistance.