We have prepared the Si/Mo multilayer consisting of active/inactive material using rf/dc magnetron sputtering. The pre-treatment using an ECR plasma were introduced at current collector for the adhesion and removal of surface contamination. The structural and electrochemical characteristics of multilayers have been investigated. The multilayer nearly maintained more than 90 % of the initial capacity (2653 mAh/g) after 100 cycles whereas the Si thin film was gradually degraded after 40 cycles.