Previous Article Next Article Table of Contents Materials Science Forum, Vol.490-491, 613-618, 2005 Export Citation Effect of substrate temperature on crystal orientation and residual stress in RF sputtered gallium nitride films Kusaka K, Hanabusa T, Tominaga K, Yamauchi N Keywords:residual stress;gallium nitride film;crystal orientation;X-ray diffraction Please enable JavaScript to view the comments powered by Disqus.
