Previous Article Next Article Table of Contents Materials Science Forum, Vol.490-491, 637-642, 2005 Export Citation Evaluation of residual stress in nano-TiO2 film on ITO glass by synchrotron X-ray diffraction Ju DY, Ueda T, Hatakeyama T, Arizono T, Kusaka K, Hanabusa T Keywords:TiO2 film;PVD;residual stress;synchrotron X-ray diffraction Please enable JavaScript to view the comments powered by Disqus.
