Previous Article Next Article Table of Contents Materials Science Forum, Vol.490-491, 661-666, 2005 Export Citation Residual stress measurement in sputtered copper thin films by synchrotron radiation and ordinary X-rays Hataya M, Hanabusa T, Kusaka K, Tominaga K, Matsue T, Sakata O Keywords:nano-size thin film;copper film;synchrotron radiation;X-rays;residual stress Please enable JavaScript to view the comments powered by Disqus.
