Solid-State Electronics, Vol.77, 87-92, 2012
Fabrication of the array chlorine ion sensor based on microfluidic device framework
In this study, array chlorine ion sensor was integrated to the poly-dimethylsiloxane (PDMS) microchannel as the microfluidic device for measuring concentration of the chlorine ion in dynamical. The microchannel was fabricated by photolithography and etching technology as the upper cover of the microfluidic device, which was used to observe electrochemical characterization of the chlorine ion selective membrane with different concentrations of the sodium chloride solution in dynamic condition. The chlorine ion selective membranes were immobilized on the ruthenium dioxide (RuO2) thin film for performing the chlorine ion sensor. Arrayed chlorine ion sensor was fabricated by radio frequency sputtering technology and screen-printed technology, which was fabricated as the lower cover of a novel microfluidic device. A novel microfluidic device could be determined with a detection limit of 10(-4) M and the range of linearity is from 0.1 M to 10(-4) M, as well as, the best flow rate is 15 mu l/min. In this detecting range, the average sensitivity and linearity of arrayed chlorine ion sensor were 33.73 mV/decade and 0.996, respectively. (c) 2012 Elsevier Ltd. All rights reserved.
Keywords:Microfluidic device;Poly-dimethylsiloxane;Ruthenium dioxide;Photolithography technology;Etching technology;Sodium ion