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Solid-State Electronics, Vol.87, 1-3, 2013
p/i/n-Type poly-Si thin-film transistor for quasi-static capacitance-voltage measurement
We propose employing a p/i/n-type poly-Si thin-film transistor (TFT) for quasi-static capacitance voltage (C-V) measurement. Since the electric current smoothly flows through either the n-type or p-type region, relatively high measurement frequency can be used to observe a quasi-static C-V characteristic for any voltage conditions, which improves the signal-noise ratio. The quasi-static C-V characteristics are available for various analyses such as extraction of trap densities. (c) 2013 Elsevier Ltd. All rights reserved.
Keywords:p/i/n;Poly-Si;Thin-film transistor (TFT);Quasi-static;Capacitance-voltage (C-V) measurement