Journal of Colloid and Interface Science, Vol.208, No.2, 367-372, 1998
Replacing solvent drying technique for nanometer particle preparation
A prepration technique for nanometer particles, namely the replacing solvent drying technique, was developed. The main process of the technique including replacement of water in gel with special organic solvent and the removal of the solvent by distillation. No collapse of gel structure took place because of low interface tension between water and the solvent as well as low surface tension of the solvent. Where special apparatus and strictly limited preparation conditions were not necessary. The technique is noted for its low preparation cost and high universality. Titanium oxide and copper berate were prepared using the technique and were characterized using XRD, nitrogen physical adsorption, TEM, and small angle X-ray scattering. Results indicated that the titanium oxide and copper berate possessed particle sizes of 7-10 and 7-20 nn as well as a specific surface area of 235 m(2)/g and 360 m(2)/g, respectively. The specific surface area were even much higher than that of the samples prepared using supercritical drying technique.