Phase separated Al-Si films were deposited by simultaneous filtered cathodic vacuum arc (FCVAD) and magnetron sputter deposition. The deposited films were etched to remove the nanocolumns of Al to produce a Si mesoporous structure. The pore size ranged from 3 nm to 6 nm with narrow distribution in size. The pore separation ranged from 6.5 nm to 11.5 nm. The results are interpreted using a model to describe the pore size as a function of the depositing particle impingement energy. (c) 2012 Elsevier B.V. All rights reserved.