We report a method for the fabrication of high structural quality CrN nanoislands on Cu(001). The CrN nanoislands can be fabricated in ultrahigh vacuum conditions by means of Cr atoms deposition on saturated Cu(001)c(2x2)-N surface and subsequent annealing at 500 degrees C. Existence of two types of nanoislands is shown by scanning tunneling microscopy investigations with atomic resolution for different CrN nanoislands formed on surface with 0.35 monolayer Cr coverage. The measured in-plane lattice constant (a=0.39 +/- 0.01 nm) of the CrN nanoislands is 8% larger than the Cu substrate lattice. X-ray photoemission spectroscopy investigations reveal chromium nitride phase transition from CrN to Cr2N associated with changes of Cr concentration. (C) 2012 Elsevier B.V. All rights reserved.