Deposition of electrochromic organonickel oxide (NiOxCy) films onto glass/indium tin oxide (ITO) substrates using atmospheric-pressure plasma-enhanced chemical vapor deposition with an atmospheric pressure plasma jet under various precursor injection angles is investigated. A precursor [nickelocene, Ni(C5H5)(2)] vapor, carried by argon gas and mixed with oxygen gas, is injected into an air plasma torch for the deposition of NiOxCy films by a short exposure of the substrate, 20 s, in the plasma. Uniform light modulation on glass/ITO/NiOxCy is produced while the moving glass/ITO substrate is exposed to the plasma torch at room temperature (similar to 23 degrees C) and under atmospheric pressure. Light modulation with up to a 40.9% transmittance variation at a wavelength of 513.9 nm under Li+ intercalation and de-intercalation in a 1 M LiClO4-propylene carbonate electrolyte is achieved. (C) 2012 Elsevier B.V. All rights reserved.