환경친화적인 실리콘 웨이퍼 세정 연구

윤효섭; 류근걸

Clean Technology, Vol.6, No.1, 79-84, June, 2000

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환경친화적인 실리콘 웨이퍼 세정 연구

A Study on environmental-friendly Cleaning for Si-wafers

윤효섭, 류근걸

초록

반도체 세정공정에서 사용되는 화학약품의 소모량을 줄이기 위하여 소량의 전해질 혹은 초순수만을 전기분해 시켜 생성되는 전리수를 이용하여 금속 불순물들이 오염된 실리콘 웨이퍼를 습식세정을 하였다. 전리수는 다양한 범위의 pH 및 산화환원전위(oxidation-reduction potential, ORP)를 형성할 수 있으며, 전리수의 양극수는 pH 및 산화환원전위를 각각 4.7 및 +1000mV의 산화성 수용액을, 전리수의 음극수는 pH 및 산화환원전위가 각각 6.3 및 -550mV를 40분 이상 유지하고 있었다. 실리콘 웨이퍼 세정 전과 후의 금속 불순물 측정은 ICP-MS(Inductively coupled plasma spectroscopy)를 사용하였다. 전리수 가운데 양극수는 구리 불순물 제거에, 음극수는 철 불순물 제거에 효과적임을 확인하였다.

In this study, to reduce the consumption of chemicals in cleaning processes, Si-wafers contaiminated with metallic impurities were cleaned with electrolyzed water(EW), which was generated by the electrolysis of a diluted electrolyte solution or ultra pure water(UPW). Electrolyzed water could be controlled for obtaining wide ranges of pH and ORP(oxidation-reduction potential). The pH and oxidation-reduction potential of anode water and cathode water were measured to be 4.7 and +1000mV, and 6.3 and -550mV, respectively. To analyze the amount of metallic impurities on Si-wafer surfaces, ICP-MS was introduced. Anode water was effective for Cu removal, while cathode water was more effective for Fe removal.

Keywords:electrolyzed water(EW);anode water;cathode water;oxidation-reduction potential(ORP)

[References]

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[1] Ojima S, Kubo K, Kato M, Toda M, Ohmi T, J. Electrochem. Soc., 144(4), 1482 (1997)

[2] Jeon H, Ceramic Processing Workshop Proceedings, Vol. 2, 19 (1999)

[3] Graf D, Suhren M, Lambert U, Schmolke R, Ehlert A, von Ammon W, Wagner P, J. Electrochem. Soc., 145(1), 275 (1998)

[4] Morita H, Ida J, Ii T, Ohmi T, Proceeding of the IEEE International Symposium on Semiconductor Manufacturing Conference, 453 (1999)

[5] Ohmi T, J. Electrochem. Soc., 143(9), 2957 (1996)

[6] Morita H, Ida J, Mizuniwa T, Ohmi T, Solid State Phenom., 65-66, 7 (1999)

[7] 박명구, 안태항, 이종무, 전형탁, 류근걸, 한국재료학회지, 6, 661 (1996)

[8] Aoki H, Yamasaki S, Nakamori M, Aoto N, Yamanaka K, Imaoka T, Futatsuki T, Mat. Res. Soc. Symp. Proc., 477, 501 (1997)

[9] 이종무, 박웅, 전형탁, 안태항, 백종태, 신광수, 이동형, 한국재료학회지, 8, 751 (1998)

[10] Yamanaka K, Imaoka T, Futatsuki T, Yamashita Y, Mitsumori K, Kasama Y, Aoki H, Yamasaki S, Aoto N, Langmuir, 15(12), 4165 (1999)

[11] Pourbaix M, "Atlas of Electrochemical Equilibria in Aqueous Solutions," NACE International Cebelcor, 307 (1974)

[12] Kern W, "Handbook of Semiconductor Wafer Cleaning Technology," Noyes Publications, 111 (1993)

[13] Shiramizu Y, Watanabe K, Tanaka M, Aoki H, Kitajima H, J. Electrochem. Soc., 143(5), 1632 (1996)