Application of 532 nm YAG-Laser Annealing to Crystallization of Amorphous Si Thin Films Deposited on Glass Substrates

Jong-Won Lee; Byung-Soo So; Haseung Chung; Jin-Ha Hwang

Korean Journal of Materials Research, Vol.18, No.3, 113-116, March, 2008

DOI10.3740/MRSK.2008.18.3.113 Export Citation

Application of 532 nm YAG-Laser Annealing to Crystallization of Amorphous Si Thin Films Deposited on Glass Substrates

Jong-Won Lee, Byung-Soo So, Haseung Chung¹, and Jin-Ha Hwang^†

Dept. of Materials Science and Engineering, Hongik Univeristy, Korea
¹Dept. of Mechanical and System Design Engineering, Hongik Univeristy, Korea

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A 532 nm Nd-YAG laser was applied to crystallize amorphous Si thin films in order to evaluate the applicability of a Nd-YAG laser to low-temperature polycrystalline Si technology. The irradiation of a green laser was controlled during the crystallization of amorphous Si thin films deposited onto glass substrates in a sophisticated process. Raman spectroscopy and UV-Visible spectrophotometry were employed to quantify the degree of crystallization in the Si thin films in terms of its optical transmission and vibrational characteristics. The effectiveness of the Nd-YAG laser is suggested as a feasible alternative that is capable of crystallizing the amorphous Si thin films.

Keywords:YAG laser;crystallization;amorphous Si;polycrystalline Si

[References]

Komiya N, Nishikawa R, Okuyama M, Yamada T, Saito Y, Oima S, Yoneda K, Kanno H, Takahashi H, Rajeswaran G, Itoh M, Boroson M, Hatear TK, Proceeding of the 10th International Workshop on Inorganic and Organic Electroluminescence (2000) p. 347. (2000)
Sera K, Okumura F, Uchida H, Itoh S, Karelso S, Hotta K, IEEE Trans. Electron Devices, 36(12), 2868 (1999)
Crowder MA, Garey PG, Smith PM, Sposili RS, Cho HS, IEEE Electron Device Lett., 19(8), 306 (1998)
Yamamoto M, Nishitani H, Sakai M, Gotoh M, Taketomi Y, Tsutsu T, Nishitani M, Euro Display 99 Proceedings (1999) p.53. (1999)
Ibok E, Garg S, J. Electrochem. Soc., 140, 2927 (1993)
Little TW, Takahara KI, Koike H, Nakazawa T, Yudasaka I, Ohshima H, Jpn. J. Appl. Phys., 30, 3724 (1991)
Im JS, Sposili RS, Mater. Res. Bull., 2(3), 39 (1996)
Kakkad R, Smith J, Lau WS, Fonash SJ, Kerns R, J. Appl. Phys., 65, 2069 (1989)
Nast O, Wenham SR, J. Appl. Phys., 88, 124 (2000)
Lee SW, Joo SK, IEEE Electron Device Lett., 17(4), 160 (1996)
Jin Z, Bhat GA, Yeung M, Kwok HS, Wong M, J. Appl. Phys., 84, 194 (1998)
Park S, Jun SI, Song KS, Kim CK, Choi DK, Jpn. J. Appl. Phys., 38, L108 (1999)
Vibrational Spectroscopies and NMR,, Chap 8. in, Encyclopedia of Materials Characterization: Surfaces, Interfaces, Thin Films, Edited by Brundle CR, Evans CA, Jr, Wilson S, Manning Publishing Co., (1992) p. 413. (1992)
Tay L, Lockwood DJ, Baribeau JM, Wu X, Sproule GI, J. Vac. Sci. Technol. A, 22(3), 943 (2004)
Zi J, Buscher H, Falter C, Ludwig W, Zhang K, Xie X, Appl. Phys. Lett., 69, 200 (1996)

[Referenced By]

[1] Komiya N, Nishikawa R, Okuyama M, Yamada T, Saito Y, Oima S, Yoneda K, Kanno H, Takahashi H, Rajeswaran G, Itoh M, Boroson M, Hatear TK, Proceeding of the 10th International Workshop on Inorganic and Organic Electroluminescence (2000) p. 347. (2000)

[2] Sera K, Okumura F, Uchida H, Itoh S, Karelso S, Hotta K, IEEE Trans. Electron Devices, 36(12), 2868 (1999)

[3] Crowder MA, Garey PG, Smith PM, Sposili RS, Cho HS, IEEE Electron Device Lett., 19(8), 306 (1998)

[4] Yamamoto M, Nishitani H, Sakai M, Gotoh M, Taketomi Y, Tsutsu T, Nishitani M, Euro Display 99 Proceedings (1999) p.53. (1999)

[5] Ibok E, Garg S, J. Electrochem. Soc., 140, 2927 (1993)

[6] Little TW, Takahara KI, Koike H, Nakazawa T, Yudasaka I, Ohshima H, Jpn. J. Appl. Phys., 30, 3724 (1991)

[7] Im JS, Sposili RS, Mater. Res. Bull., 2(3), 39 (1996)

[8] Kakkad R, Smith J, Lau WS, Fonash SJ, Kerns R, J. Appl. Phys., 65, 2069 (1989)

[9] Nast O, Wenham SR, J. Appl. Phys., 88, 124 (2000)

[10] Lee SW, Joo SK, IEEE Electron Device Lett., 17(4), 160 (1996)

[11] Jin Z, Bhat GA, Yeung M, Kwok HS, Wong M, J. Appl. Phys., 84, 194 (1998)

[12] Park S, Jun SI, Song KS, Kim CK, Choi DK, Jpn. J. Appl. Phys., 38, L108 (1999)

[13] Vibrational Spectroscopies and NMR,, Chap 8. in, Encyclopedia of Materials Characterization: Surfaces, Interfaces, Thin Films, Edited by Brundle CR, Evans CA, Jr, Wilson S, Manning Publishing Co., (1992) p. 413. (1992)

[14] Tay L, Lockwood DJ, Baribeau JM, Wu X, Sproule GI, J. Vac. Sci. Technol. A, 22(3), 943 (2004)

[15] Zi J, Buscher H, Falter C, Ludwig W, Zhang K, Xie X, Appl. Phys. Lett., 69, 200 (1996)