Korean Journal of Materials Research, Vol.16, No.1, 19-24, January, 2006
rf 마그네트론 스파터법에 의해 제조된 태양전지용 ZnO:Al 박막의 전기 광학적 특성
Electrical and Optical Characteristics of ZnO:Al Films Prepared by rf Magnetron Sputtering for Thin Film Solar Cells Application
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ZnO:Al(AZO) films prepared by rf magnetron sputtering on glass substrate and textured by post-deposition chemical etching were applied as front contact and back reflectors for [Math Processing Error] -Si:H thin film solar cells. For the front transparent electrode contact, AZO films were prepared at various working pressures and substrate temperature and then were chemically etched in diluted HCl(1%). The front AZO films deposited at low working pressure(1 mTorr) and low temperature ( [Math Processing Error] ) exhibited uniform and high transmittance ( [Math Processing Error] 80%) and excellent electrical properties. The solar cells were optimized in terms of optical and electrical properties to demonstrate a high short-circuit current.
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