CVD법에 의해 제작된 광촉매 TiO2 〈112〉 우선배향의 특성

강경태; 진정근; 강필규; 노대호; 변동진; Kyoungtae Kang; Junggeun Jhin; Pilkyu Kang; Dae-ho Ro; Dongjin Byun

Korean Journal of Materials Research, Vol.13, No.7, 436-441, July, 2003

DOI10.3740/MRSK.2003.13.7.436 Export Citation

CVD법에 의해 제작된 광촉매 TiO2 〈112〉 우선배향의 특성

The Characteristics of 〈112〉-preferred Orientation for Photocatalytic TiO2 Fabricated by CVD

강경태, 진정근, 강필규, 노대호, 변동진 ^†

고려대학교 재료공학과

Kyoungtae Kang, Junggeun Jhin, Pilkyu Kang, Dae-ho Ro, and Dongjin Byun^†

Department of Materials Science & Engineering, Korea University, Seoul, Korea 136-701

E-mail:

The characteristics of <112> orientation were studied for the thin films, which were prepared on the glass by CVD (chemical vapor deposition) at various substrate temperatures. It was confirmed that films exhibited <112>-preferred orientation in a specific temperature range. Although polycrystalline film grown deposited at relatively low temperature showed the growth of random directions, the <112>-preferred orientation was gradually developed with increasing deposition temperature. According to exhibit higher degree of <112>-preferred orientation, thin film showed porous surface morphology, well-developed columnar structure, and deeper voids resulted from non-aggregation of columns were observed. In addition, transmittance was enhanced. Therefore, the growth of with <112>-preferred orientation is suitable for glass coating because of predominance of photocatalytic efficiency and transmittance.

Keywords:CVD;photocatalytic;preferred orientation

[References]

Shibata H, Murota M, Hashimoto K, Jpn. J. Appl. Phys., 32, 4479 (1993)
Veprek S, Thin Solid Films, 130, 135 (1985)
Hecht E, Optics, Addison-Wesley, (1987) (1987)
Alberici RM, Jardim WE, Appl. Catal. B: Environ., 14(1-2), 55 (1997)
Haneman D, Surf. Sci., 86, 462 (1979)
Kikuchi Y, Sumada K, Iyoda T, Hashimoto K, J. Photochem. Photobiol. A, 106, 51 (1997)
Wang R, Hashimoto K, Fujishima A, Chikuni M, Kojima E, Kitamura A, Shimohigoshi M, Watanabe T, Nature, 388(6641), 431 (1997)
Wang R, Hashimoto K, Fujishima A, Chikuni M, Kojima E, Kitamura A, Shimohigoshi M, Watanabe T, Adv. Mater., 10(2), 135 (1998)
Byun D, Jin Y, Kim B, Lee JK, Park D, J. Hazard. Mater., 73(2), 199 (2000)
Paz Y, Heller A, J. Mater. Res., 12, 2759 (1997)
Kim B, Byun D, Lee JK, Park D, Jpn. J. Appl. Phys., 41, 222 (2002)
Lotgering FK, J. Inorg. Nucl. Chem., 9, 113 (1959)
Hartman P, Crystal Growth, North-Holland, Amsterdam, (1973) (1973)
Tanaka N, Ohshio S, Saitoh H, J. Ceram. Soc. Jpn., 105, 551 (1997)
Van der Drift A, Philips Res. Rep., 22, 267 (1967)
Weibberger BR, Garber RB, Appl. Phys. Lett., 55, 2409 (1995)
Meng LJ, Dos Santos MP, Thin Solid Films, 226, 22 (1993)

[Related Articles]

[1] Shibata H, Murota M, Hashimoto K, Jpn. J. Appl. Phys., 32, 4479 (1993)

[2] Veprek S, Thin Solid Films, 130, 135 (1985)

[3] Hecht E, Optics, Addison-Wesley, (1987) (1987)

[4] Alberici RM, Jardim WE, Appl. Catal. B: Environ., 14(1-2), 55 (1997)

[5] Haneman D, Surf. Sci., 86, 462 (1979)

[6] Kikuchi Y, Sumada K, Iyoda T, Hashimoto K, J. Photochem. Photobiol. A, 106, 51 (1997)

[7] Wang R, Hashimoto K, Fujishima A, Chikuni M, Kojima E, Kitamura A, Shimohigoshi M, Watanabe T, Nature, 388(6641), 431 (1997)

[8] Wang R, Hashimoto K, Fujishima A, Chikuni M, Kojima E, Kitamura A, Shimohigoshi M, Watanabe T, Adv. Mater., 10(2), 135 (1998)

[9] Byun D, Jin Y, Kim B, Lee JK, Park D, J. Hazard. Mater., 73(2), 199 (2000)

[10] Paz Y, Heller A, J. Mater. Res., 12, 2759 (1997)

[11] Kim B, Byun D, Lee JK, Park D, Jpn. J. Appl. Phys., 41, 222 (2002)

[12] Lotgering FK, J. Inorg. Nucl. Chem., 9, 113 (1959)

[13] Hartman P, Crystal Growth, North-Holland, Amsterdam, (1973) (1973)

[14] Tanaka N, Ohshio S, Saitoh H, J. Ceram. Soc. Jpn., 105, 551 (1997)

[15] Van der Drift A, Philips Res. Rep., 22, 267 (1967)

[16] Weibberger BR, Garber RB, Appl. Phys. Lett., 55, 2409 (1995)

[17] Meng LJ, Dos Santos MP, Thin Solid Films, 226, 22 (1993)