열처리에 따른 SnO2 박막의 표면형상

박경희; 류현욱; 서용진; 이우선; 홍광준; 박진성; Kyung Hee Park; Hyun Wook Ryu; Yong Jin Seo; Woo Sun Lee; Kwang Jun Hong; Jin Seong Park

Korean Journal of Materials Research, Vol.13, No.7, 442-446, July, 2003

DOI10.3740/MRSK.2003.13.7.442 Export Citation

열처리에 따른 SnO2 박막의 표면형상

Influence of Thermal Treatment on Surface Morphology of Tin Dioxide Thin Films

박경희^†, 류현욱, 서용진¹, 이우선², 홍광준³, 박진성⁴

조선대 에너지자원신기술연구소
¹대불대학교 전기공학과
²조선대학교 전기공학과
³조선대학교 물리학과
⁴조선대학교 재료공학과

Kyung Hee Park^†, Hyun Wook Ryu, Yong Jin Seo¹, Woo Sun Lee², Kwang Jun Hong³, and Jin Seong Park⁴

Research Institute of Energy Resources Technology, Chosun University, Gwangju 504-759, Korea
¹Department of Electrical Engineering, Daebul University, Chonnam 526-890, Korea
²Department of Electrical Engineering, Chosun University, Gwangju 501-759, KOrea, Korea
³Department of Physics, Chosun University, Gwangju 501-759, Korea
⁴Department of Material Engineering, Chosun University, Gwangju 501-759, Korea

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Tin dioxide () thin films were deposited at on alumina substrate by metal-organic chemical vapor deposition. A few hillocks like a cauliflower were observed and the number of hillock on thin film surface increased with annealing temperature in air atmosphere. The oxygen content and the binding energy during air annealing at came to close the stoichiometric . The cauliflower hillocks seem to be the result of the continuous migration of the tiny grains to release the stress of an expanded grain. Sensitivity of CO gas depended on annealing temperature and increased with increasing annealing temperature.

Keywords:thin films;MOCVD;tin dioxide;XPS;annealing

[References]

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[1] Jarzebski ZM, Marton JP, J. Electrochem. Soc., 123, 199 (1976)

[2] Goetzberger A, Hebling C, Sol. Energy Mater. Sol. Cells, 62, 1 (2000)

[3] Park SS, Mackenzie JD, Thin Solid Films, 274(1-2), 154 (1996)

[4] Salehi A, Gholizade M, Sens. Actuators B, 89, 173 (2003)

[5] Reddy MH, Chandukar AN, Thin Solid Films, 349, 200 (1999)

[6] Thompson AG, Materials Letters, 30, 255 (1997)

[7] Choudhury NS, Goehner RP, Lewis N, Green RW, Thin Solid Films, 122, 231 (1984)

[8] Leja E, Pisarkiewicz T, Kolodziej A, Thin Solid Films, 67, 45 (1998)

[9] Sanlines R, Coluzza C, Rosenfeld D, Gozzo F, Ph. Almeras, Levy F, J. Appl. Phys., 73, 3997 (1993)

[10] Kaneko S, Yagi I, Murakami K, Okuya M, Solid State Ionics, 141, 463 (2001)

[11] Paranjape MA, Mane AU, Raychaudhuri AK, Shalini K, Shivashankar SA, Chakravarty BR, Thin Solid Films, 413(1-2), 8 (2002)

[12] Lau CL, Werthein GK, J. Vacuum Sci. Tech., 15, 622 (1978)