화학공학소재연구정보센터
Korean Journal of Materials Research, Vol.12, No.2, 112-116, February, 2002
MOVPE법으로 GaN위에 성장시킨 A1 1-x In x N 박막의 광학적 특성
Optical Properties of A1 1-x In x N Thin film on GaN Grown by MOVPE
E-mail:
e studied optical properties of Al 1?x In x N films. Films were grown on GaN by metalorganic vapor-phase epitaxy. The AlInN layer was grown on GaN layer with an α -Al 2 O 3 substrate. X-ray diffraction, optical absorption spectroscopy, photoluminescence(PL) and reflection high energy electron diffraction(RHEED) measurements of AlInN showed that the crystalline quality of Al 1?x In x N layer was improved around x=0.17, at which the lattice constant was matched to the GaN and the band gap of AlInN is larger than that of GaN.
  1. Sato M, J. Appl. Phys., 78(3), 2123 (1995)
  2. Mohammad SN, Morkoc H, J. Appl. Phys., 78(6), 4200 (1995)
  3. Guo Q, Ogawa H, Yoshida A, J. Cryst. Growth, 146, 462 (1995)
  4. Kim KS, Saxler A, Kung P, Raseghi M, Appl. Phys. Lett., 71(6), 800 (1997)
  5. Kubota K, Kobayashi Y, Fujimoto K, Appl. Phys. Lett., 66(7), 2984 (1989)
  6. Kosaki M, Mochisuki S, Nakamura T, Yukawa Y, Nitta S, Yamaguchi S, Amano H, Akasaki I, Jpn. J. Appl. Phys., 40, L420 (2001)
  7. Yamaguchi S, Kariya M, Nitta S, Takeuchi T, Wetzel C, Amano H, Akasaki I, J. Cryst. Growth, 195, 309 (1998)