Korean Journal of Materials Research, Vol.12, No.2, 112-116, February, 2002
MOVPE법으로 GaN위에 성장시킨 A1 1-x In x N 박막의 광학적 특성
Optical Properties of A1 1-x In x N Thin film on GaN Grown by MOVPE
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e studied optical properties of Al 1?x In x N films. Films were grown on GaN by metalorganic vapor-phase epitaxy. The AlInN layer was grown on GaN layer with an α -Al 2 O 3 substrate. X-ray diffraction, optical absorption spectroscopy, photoluminescence(PL) and reflection high energy electron diffraction(RHEED) measurements of AlInN showed that the crystalline quality of Al 1?x In x N layer was improved around x=0.17, at which the lattice constant was matched to the GaN and the band gap of AlInN is larger than that of GaN.
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