Radio frequency-sputtered MoS2 films had been exposed for 43.5 h in real low earth orbit (LEO) space environment by a space environment exposure device (SEED) aboard China Shenzhou-7 manned spaceship. The composition, morphology, phase structure and friction property of the exposed films were investigated using X-ray photoelectron spectroscope (XPS), X-ray diffraction (XRD), field emission scanning electron microscope (FESEM), X-ray energy-dispersive spectroscopy (EDS) and ball-on-disk tribometer. XRD and EDS results revealed that the as-deposited MoS2 films were characterized by a MoSxOy phase structure, in which x and y values were determined to be similar to 0.65 and 1.24, respectively. XPS analysis revealed that due to space atomic oxygen attack, the film surface was oxidized to MoO3 and MoSxOy with higher O concentration, while the partial S was lost. However, the affected depth was restricted within the surface layer because of protective function of the oxidation layer. As a result, the friction coefficient only exhibited a slight increase at initial stage of sliding friction. (C) 2015 Elsevier B.V. All rights reserved.