In this study La0.6Ca0.4Fe0.8Ni0.2O3 - delta (LCFN) thin films are deposited on SrTiO3(100) (STO(100)) and Si(100) substrates by pulsed laser deposition at oxygen pressure of 13.3, 26.7, 40 and 53.3 Pa. For LCFN/STO, X-ray diffraction and field emission scanning electronmicroscopy show film growth along (100) direction. The electrical resistivity measurements reveal that PO2= 40 Pa provides an optimumelectrical propertieswith an electrical conductivity as high as 69 Scm(-1) and small polaron activation energy of 0.09 eV. It is attributed to increased films oxygen concentration and enhanced grains intimate contact. Also, by themeasurement of electrical conductivity relaxation, chemical surface exchange coefficient of the film deposited at 40 Pa is calculated. Moreover, the effect of substrate type on the films electrical resistance is studied. (C) 2014 Elsevier B.V. All rights reserved.