레이저 미세가공 기술을 이용한 초소형 전자빔 장치용 정전장 전자렌즈의 제작

안승준; 김대욱; 김호섭; 김영정; 이용산; S.J. Ahn; D.W. Kim; H.S. Kim; Y.J. Kim; Y.S. Lee

Korean Journal of Materials Research, Vol.11, No.9, 792-796, September, 2001

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레이저 미세가공 기술을 이용한 초소형 전자빔 장치용 정전장 전자렌즈의 제작

Fabrication of Electrostatic Electron Lens for Electron Beam Microcolumn using the Laser Micromachining

안승준^†, 김대욱, 김호섭, 김영정¹, 이용산²

선문대학교 자연과학대학 신소재과학과
¹선문대학교 공과대학 재료공학부
²대진대학교 이공대학 물리학과

S.J. Ahn^†, D.W. Kim, H.S. Kim, Y.J. Kim¹, and Y.S. Lee²

Department of Physics and Advanced Material Science, Sun Moon University, Korea
¹Division of Materials Engineering, Sun Moon University, Korea
²Department of Physics, Dajin University, Korea

E-mail:

For electron beam lithography and SEM(scanning electron microscopy) applications, miniaturized electrostatic lenses called a microcolumn have been fabricated. In this paper, we report the fabrication technique for 20~30 μm apertures of electron lenses based on silicon and Mo membrane using an active Q-switched Nd:YAG laser. Experimental conditions of laser micromachining for silicon and Mo membrane are improved. The geometrical structures, such as the diameter and the preciseness of the micron-size aperture are dependent upon the total energy of the laser pulse train, laser pulse width, and the diameter of laser spot.

Keywords:microcolumn;electron lens;laser micromachining;active Q-switched Nd:YAG laser;electron beam lithography

[References]

Davis RC, Williams CC, Neuzil P, Appl. Phys. Lett., 66, 18 (1995)
Clymer BD, Appl. Opt., 28, 5375 (1989)
Park JY, Lera JD, Yakshin MA, Choi SS, Lee Y, Chun KJ, Lee JD, Jeon D, Kuk Y, J. Vac. Sci. Technol. B, 15(6), 2749 (1997)
Ahn SJ, Kim DW, Kim HS, Cho KH, Choi SS, Appl. Phys. A-Mater. Sci. Process., 69, s527 (1999)
Charschan SS, Laser in Industry, Van Nostrand Reinhold Company (1972).
Beyer H, Ross W, Rudolph R, Michaelis A, Uhlenbusch J, Viol W, J. Appl. Phys., 70, 75 (1991)
Oliveira V, Vilar R, J. Mater. Res., 12, 3206 (1997)
Washio K, SPIE, 3618, 230 (1999)
Paek UC, Gagliano FP, IEEE. J. Quantum Electronics, QE-8, 112 (1972)
Liu X, Du D, Mourou G, IEEE. J. Quantum Electronics, QE-33, 1706 (1997)
Chunand MK, Rose K, J. Appl. Phys., 41, 614 (1970)
Dabby FW, Paek UC, IEEE. J. Quantum Electronics, QE-8, 106 (1972)
Ready JF, Industrial Application of Lasers, Academic Press (1997).
Du D, Liu X, Korn G, Squier J, Mourou G, Appl. Phys. Lett., 64, 3071 (1994)
Strickland D, Mourou G, Opt. Commun., 56, 219 (1985)
Ahn SJ, Kwak HW, Jpn. J. Appl. Phys., 37, L789 (1998)

[Referenced By]

[1] Davis RC, Williams CC, Neuzil P, Appl. Phys. Lett., 66, 18 (1995)

[2] Clymer BD, Appl. Opt., 28, 5375 (1989)

[3] Park JY, Lera JD, Yakshin MA, Choi SS, Lee Y, Chun KJ, Lee JD, Jeon D, Kuk Y, J. Vac. Sci. Technol. B, 15(6), 2749 (1997)

[4] Ahn SJ, Kim DW, Kim HS, Cho KH, Choi SS, Appl. Phys. A-Mater. Sci. Process., 69, s527 (1999)

[5] Charschan SS, Laser in Industry, Van Nostrand Reinhold Company (1972).

[6] Beyer H, Ross W, Rudolph R, Michaelis A, Uhlenbusch J, Viol W, J. Appl. Phys., 70, 75 (1991)

[7] Oliveira V, Vilar R, J. Mater. Res., 12, 3206 (1997)

[8] Washio K, SPIE, 3618, 230 (1999)

[9] Paek UC, Gagliano FP, IEEE. J. Quantum Electronics, QE-8, 112 (1972)

[10] Liu X, Du D, Mourou G, IEEE. J. Quantum Electronics, QE-33, 1706 (1997)

[11] Chunand MK, Rose K, J. Appl. Phys., 41, 614 (1970)

[12] Dabby FW, Paek UC, IEEE. J. Quantum Electronics, QE-8, 106 (1972)

[13] Ready JF, Industrial Application of Lasers, Academic Press (1997).

[14] Du D, Liu X, Korn G, Squier J, Mourou G, Appl. Phys. Lett., 64, 3071 (1994)

[15] Strickland D, Mourou G, Opt. Commun., 56, 219 (1985)

[16] Ahn SJ, Kwak HW, Jpn. J. Appl. Phys., 37, L789 (1998)