화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Korean Journal of Materials Research, Vol.11, No.3, 178-184, March, 2001
Export Citation
KLN 스퍼터링용 타겟의 제조 및 코닝 1737 유리 기판위에 성장시킨 박막의 광학적 성질
Target Preparation for KLN sputtering and optical properties of thin films deposited on Corning 1737 glass
박성근, 서정훈, 김성연, 전병억1, 김진수1, 김지현2, 최시영3, 김기완3
  • 현대전자산업 System IC Bu
  • 1부산대학교 물리학과
  • 2텍사스 대학교
  • 3경북대학교 전자공학과
Sung-Kun PARK, Jung-Hoon SEO, Sung-Youn KIM, Byeong-Eok JUN1, Jin-Soo KIM1, Ji-Hyun KIM2, Sie-Young Choi3, and Ki-Wan KIM3
  • System IC BU, Hyundai Electronics Industries, Korea
  • 1Department of Physics, Pusan National University, Korea
  • 2Department of Electrical and computer Engineering, University of Texas, Korea
  • 3Department of Electronic Engineering, Kyungpook National University, Korea
초록
rf-마그네트론 스퍼터링 방법을 이용하여 높은 광투과성을 지니며 c-축 배향된 KLN 박막을 제작하였다. 하소 및 소결 과정을 거쳐서 균일하고 안정한 상태의 KLN 타겟을 제조하였다. KLN 타겟은 화학량론적인 조성 및 K가 30%, 60%, 그리고 Li가 각각 15%, 30% 과량된 조성을 사용하였으며 K와 Li의 휘발을 방지하기 위하여 낮은 온도에서 소결시켰다. 제조된 타겟을 사용하여 rf-magnetron sputtering 방법으로 박막을 제조하였으며, 이때 K가 60% Li가 30% 과량된 타겟으로 제조할 때 단일상의 KLN 박막을 얻을 수 있었다. KLN 박막은 코닝 1737 기판 위에서 우수한 결정성과 높은 c-축 배향성을 나타내었으며, 이때 박막의 성장조건은 고주파 전력 100 W, 공정 압력 150 mTorr, 기판 온도 58 0 ? C 였다. 가시광 영역에서 박막의 투과율은 약 90% 이고, 흡수는 333 nm에서 발생하였으며 632.8 nm에서 박막의 굴절율은 1.93이었다.
Transparent and highly oriented KLN thin films have been grown by an rf- magnetron sputtering deposition method. A homogeneous and stable KLN target was prepared by calcine and sintering process. For KLN target, stoichiometry and composition excess with K of 30% and 60%, and Li of 15% and 30% respectively, was prepared. The targets were sintered at low temperature to prevent vaporization of K and Li. KLN thin films were fabricated by rf-magnetron sputtering method using those targets. In this experiment, using the target of composition excessed with K of 60% and Li of 30%, single phase KLN thin film was produced. KLN thin film has excellent crystallinity and highly c-axis oriented on Corning 1737 substrate. Transmittance of thin film in visible range was 90%, absorption edge is 333 nm and refractive index at 632.8 nm was 1.93.
Keywords:rf-magnetron sputtering;KLN(K 3 Li 2 Nb 5 O 15 );thin film;c-axis orientation;tungsten-bronze
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