- Previous Article
- Next Article
- Table of Contents
Korean Journal of Materials Research, Vol.17, No.8, 447-451, August, 2007
Ti 첨가 Al 2 O 3 코팅층의 두께와 열처리 조건이 LiCoO 2 양극 박막의 미세구조와 전기화학적 특성에 미치는 영향
Effect of Ti-Doped Al 2 O 3 Coating Thickness and Annealed Condition on Microstructure and Electrochemical Properties of LiCoO 2 Thin-Film Cathode
E-mail:
We investigated the dependence of the various annealing conditions and thickness ( 6∼45nm ) of the Ti-doped Al 2 O 3 coating on the electrochemical properties and the capacity fading of Ti-doped Al 2 O 3 coated LiCoO 2 films. The Ti-doped- Al 2 O 3 -coating layer and the cathode films were deposited on Al 2 O 3 plate substrates by RF-magnetron sputter. Microstructural and electrochemical properties of Ti-doped- Al 2 O 3 -coated LiCoO 2 films were investigated by transmission electron microscopy (TEM) and a dc four-point probe method, respectively. The cycling performance of Ti-doped Al 2 O 3 coated LiCoO 2 film was improved at higher cut-off voltage. But it has different electrochemical properties with various annealing conditions. They were related on the microstructure, surface morphology and the interface condition. Suppression of Li-ion migration is dominant at the coating thickness >24.nm during charge/discharge processes. It is due to the electrochemically passive nature of the Ti-doped Al 2 O 3 films. The sample be made up of Ti-doped Al 2 O 3 coated on annealed LiCoO 2 film with additional annealing at 400 ? C had good adhesion between coating layer and cathode films. This sample showed the best capacity retention of ∼92 with a charge cut off of 4.5 V after 50 cycles. The Ti-doped Al 2 O 3 film was an amorphous phase and it has a higher electrical conductivity than that of the Al 2 O 3 film. Therefore, the Ti-doped Al 2 O 3 coated improved the cycle performance and the capacity retention at high voltage (4.5 V) of LiCoO 2 films.
- Jones SD, Akridge JR, Solid State Ion., 53, 628 (1992)
- Bate JB, Gruzalski BR, Dudney NJ, Luck CF, Yu X, Solid State Ion., 70, 619 (1994)
- Chang HSW, Lee TJ, Lin SC, Jeng JH, J. Power Sources, 54, 403 (1995)
- Reimers JN, Dahn JR, J. Electrochem. Soc., 139, 2091 (1992)
- Scrosati B, J. Electrochem. Soc., 139, 2776 (1992)
- Amatucci GG, Tarascon JM, Klein LC, J. Electrochem. Soc., 143(3), 1114 (1996)
- Amatucci GG, Tarascon JM, Klein LC, Solid State Ion., 83(1-2), 167 (1996)
- Aurbach D, Markovsky B, Rodkin A, Levi E, Cohen YS, Kim HJ, Schmidt M, Electrochim. Acta, 47(27), 4291 (2002)
- Cho J, Kim YJ, Park B, Chem. Mater., 12, 3788 (2000)
- Kweon HJ, Kim SJ, Park DG, J. Power Sources, 88(2), 255 (2000)
- Iriyama Y, Kurita H, Yamada I, Abe T, Ogumi Z, J. Power Sources, 137, 111 (2006)
- Hong W, Chen MC, Electrochem. Solid State Lett., 9(2), A82 (2006)
- Jung R, Lee JC, So YW, Noh TW, Oh SJ, Lee JC, Shin HJ, Appl. Phys. Lett., 83, 5226 (2005)
- Lee SR, Song JO, Appl. Phys. Lett., 86, 252501 (2005)