Coexistence of passive and active oxidation for O-2/Si(0 01) system observed by SiO mass spectrometry and synchrotron radiation photoemission spectroscopy (vol 216, pg 8, 2003)

Teraoka Y; Moritani K; Yoshigoe A

Applied Surface Science, Vol.343, 213-213, 2015

DOI10.1016/j.apsusc.2015.02.147 Export Citation

Coexistence of passive and active oxidation for O-2/Si(0 01) system observed by SiO mass spectrometry and synchrotron radiation photoemission spectroscopy (vol 216, pg 8, 2003)

Teraoka Y, Moritani K, Yoshigoe A