Being an attractive and demanding candidate in the field of energy conversion, germanium has attained widespread applications. The present work is aimed at the study of metal organic vapour phase epitaxy of germanium thin films on (0 0 1) silicon at different growth temperatures using isobutyl germane as a precursor. The epilayers were characterized by X-ray diffraction, high resolution transmission electron microscopy, atomic force microscopy and scanning electron microscopy in order to understand the structural and morphological properties. The films were found to be epitaxially grown and single crystalline with slight misorientation (below 0.1 degrees). The interface between the film and substrate was analyzed in depth and different temperature dependent growth behaviours were evidenced. The major relevant lattice imperfections observed were attributed to planar defects and threading dislocations. (C) 2015 Elsevier B.V. All rights reserved.