The critical cutting depth for lapping process is very important because it influences the mode of material removal. In this paper, a serial of microscopic indentation experiments were carried out for measuring spinel wafers' hardness and crack length in different lapping slurries. Their critical cutting depth andfracture toughness were calculated. X-ray photoelectron spectroscopy (XPS) was also employed to study the surface chemical composition and softened layer thickness of wafers in different slurries. Experimental results indicate that the softened layers of spinel wafers are formed due to the corrosion of lapping slurries, which leads to a lower hardness and a larger fracture toughness of samples, and increases the critical cutting depth. Among them, the critical cutting depth in ethylene glycol solution is the largest and up to 21.8 nm. The increase of critical cutting depth is helpful to modify the surface quality of the work-piece being lapped via ductile removal mode instead of brittle fracture mode. (C) 2015 Elsevier B.V. All rights reserved.